PMR OVERWRITE ENHANCEMENT BY MAIN POLE RIE METHOD

摘要

The embodiments of the present invention generally relate to a method for forming a trench in which a write pole is deposited therein. The trench is formed with a single mask and multiple reactive ion etching (RIE) processes and has substantially straight side walls and a consistent bevel angle along the length of the write pole. The consistent bevel angle along the length of the write pole allows the bevel angle at the ABS to be consistent regardless of where the cut is when defining the ABS.

主权项

1. A method for forming a magnetic head for perpendicular magnetic recording, comprising:
depositing a fill layer over a substrate; depositing a mask layer over the fill layer; removing a portion of the mask layer to expose a first portion of the fill layer; removing the first portion of the fill layer by a first reactive ion etching process to form a trench having a first bevel angle; removing a second portion of the fill layer from the trench by a second ion etching process to enlarge the trench and change the first bevel angle to a second bevel angle, wherein the second bevel angle is smaller than the first bevel angle; and depositing a magnetic material within the trench, wherein the trench has substantially straight side walls.