发明名称 LIQUID TREATMENT DEVICE AND LIQUID TREATMENT METHOD
摘要 <p>A solution treatment apparatus connected to a supply nozzle that supplies a treatment solution to a substrate, includes: a supply pipeline connecting a treatment solution storage container and the supply nozzle; a filter apparatus provided in the supply pipeline; a pump on a secondary side of the filter apparatus; a circulation pipeline connecting a discharge side of the pump and an intake side of the filter apparatus; a supply control valve provided in the supply pipeline on a secondary side of the pump; a circulation control valve provided in the circulation pipeline; and a control unit, wherein the control unit opens the circulation control valve and drives the pump when supply of the treatment solution from the supply nozzle to the substrate is stopped by closing the supply control valve, to thereby circulate the treatment solution between the supply pipeline having the filter apparatus and the circulation pipeline.</p>
申请公布号 KR20140129040(A) 申请公布日期 2014.11.06
申请号 KR20147023306 申请日期 2013.02.22
申请人 TOKYO ELECTRON LIMITED 发明人 YOSHIHARA KOUSUKE;ICHINO KATSUNORI;FURUSHO TOSHINOBU;SASA TAKASHI;TSUCHIYA KATSUHIRO;TERASHITA YUICHI;TAKEGUCHI HIROFUMI
分类号 H01L21/027;B01D19/00;B05C11/10;G03F7/30;H01L21/02;H01L21/302 主分类号 H01L21/027
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