发明名称 FIELD-EFFECT TRANSISTOR DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To improve the efficiency of a CMOS device while reducing the size.SOLUTION: A semi-metal structure includes a LaAlO-SrTiOheterostructure having two-dimensional hole gas 21 and two-dimensional electron gas 23. An electronic device includes a gate electrode provided on the surface of a SrTiObase layer, a source electric contact, and a drain electric contact. The source electric contact and drain electric contact can come into ohmic contact with both the two-dimensional hole gas 21 and two-dimensional electron gas 23.</p>
申请公布号 JP2014209577(A) 申请公布日期 2014.11.06
申请号 JP20140044370 申请日期 2014.03.06
申请人 TOSHIBA CORP 发明人 STUART HOLMES
分类号 H01L29/812;H01L21/336;H01L21/337;H01L21/338;H01L29/778;H01L29/78;H01L29/808 主分类号 H01L29/812
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