发明名称 PATTERNING OF MAGNETIC THIN FILM USING ENERGIZED IONS
摘要 <p>PROBLEM TO BE SOLVED: To provide a method for patterning a magnetic thin film on a substrate.SOLUTION: The method includes: providing a pattern about the magnetic thin film, with selective regions of the pattern permitting penetration of energized ions of one or more elements. Energized ions are generated with sufficient energy to penetrate the selective regions and a portion of the magnetic thin film adjacent to the selective regions. The substrate is placed to receive the energized ions. The portion of the magnetic thin film is subjected to thermal excitation. The portion of the magnetic thin film exhibits a magnetic property different from selected other portions.</p>
申请公布号 JP2014209404(A) 申请公布日期 2014.11.06
申请号 JP20140114835 申请日期 2014.06.03
申请人 APPLIED MATERIALS INC 发明人 OMKARAM NALAMASU;STEVEN VERHAVERBEKE;MAJEED FOAD;MAHALINGAM VENKATESAN;NETY M KRISHNA
分类号 G11B5/84;G11B5/64 主分类号 G11B5/84
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