发明名称 METHOD OF MANUFUCTURING LIQUID EJECTION HEAD
摘要 A method of manufacturing a liquid ejection head, and the method includes a process of providing a first photosensitive resin layer containing a photodegradable positive photosensitive resin and serving as a mold material of the channel on a substrate, a process of providing a gas barrier layer having a film density of 1 g/cm3 or more on the first photosensitive resin layer, a process of subjecting the first photosensitive resin layer and the gas barrier layer to pattern exposure, and then performing development to thereby form the mold material of a channel and also removing the gas barrier layer before or simultaneously with the development, a process of providing a second photosensitive resin layer on the mold material and the substrate, a process of subjecting the second photosensitive resin layer to pattern exposure, and then performing development, and a process of removing the mold material of the channel.
申请公布号 US2014329181(A1) 申请公布日期 2014.11.06
申请号 US201414266483 申请日期 2014.04.30
申请人 CANON KABUSHIKI KAISHA 发明人 Ishizuka Kazunari
分类号 G03F7/20 主分类号 G03F7/20
代理机构 代理人
主权项 1. A method of manufacturing a liquid ejection head having a substrate and an ejection port formation member in which a liquid channel is formed between the member and the substrate and ejection ports which communicate with the channel and eject liquid are provided, the method comprising: providing a first photosensitive resin layer containing a photodegradable positive photosensitive resin and serving as a mold material of the channel on the substrate; providing a gas barrier layer having a film density of 1 g/cm3 or more on the first photosensitive resin layer; subjecting the first photosensitive resin layer and the gas barrier layer to pattern exposure, and then performing development to thereby form a mold material of the channel and also removing the gas barrier layer before or simultaneously with the development; providing a second photosensitive resin layer serving as the ejection port formation member on the mold material of the channel and the substrate; subjecting the second photosensitive resin layer to pattern exposure, and then performing development to thereby form the ejection ports; and removing the mold material of the channel to form the channel.
地址 Tokyo JP
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