| 发明名称 |
EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD |
| 摘要 |
A part of exposure beam through a liquid(LQ) via a projection optical system(PL) enters a light-transmitting section(44), enters an optical member(41) without passing through gas, and is focused. The exposure apparatus receives the exposure light from the projection optical system to perform various measurements even if the numerical aperture of the projection optical system increases. |
| 申请公布号 |
KR20140129398(A) |
申请公布日期 |
2014.11.06 |
| 申请号 |
KR20147029481 |
申请日期 |
2004.09.29 |
| 申请人 |
NIKON CORPORATION |
发明人 |
NISHINAGA HISASHI;HIKIMA IKUO;TOYODA MITSUNORI;NAKAGAWA MASAHIRO;HAGIWARA TSUNEYUKI;MIZUNO YASUSHI;KITA NAONORI;TANITSU OSAMU;EMURA NOZOMU |
| 分类号 |
H01L21/027;G03F7/20;H01L |
主分类号 |
H01L21/027 |
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