发明名称 MOVABLE BODY SYSTEM, MOVABLE BODY DRIVE METHOD, PATTERN FORMATION APPARATUS, PATTERN FORMATION METHOD, EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
摘要 An exposure apparatus exposes a substrate with an exposure beam via a projection system supported by a frame. A substrate stage having a table that mounts the substrate is placed on a base under the projection system. A measurement device has a plurality of heads provided at the table and each irradiate a measurement beam on a grating section supported by the frame, and measures positional information of the table by a head of the plural heads, that faces the grating section. A drive device drives the substrate stage to move the substrate. A controller controls a drive of the substrate stage based on displacement information of a head used in measurement of the positional information or correction information to compensate a measurement error of the measurement device that occurs due to a displacement of the head, and based on the positional information measured by the measurement device.
申请公布号 US2014327899(A1) 申请公布日期 2014.11.06
申请号 US201414332000 申请日期 2014.07.15
申请人 NIKON CORPORATION 发明人 KANAYA Yuho
分类号 G03F7/20 主分类号 G03F7/20
代理机构 代理人
主权项 1. An exposure apparatus that exposes a substrate with an exposure beam via a projection system, the apparatus comprising: a frame supporting the projection system; a base placed under the projection system supported by the frame; a substrate stage having a table that mounts the substrate and placed on the base; a measurement device that has a plurality of heads that are provided at the table and each irradiate a measurement beam on a grating section supported by the frame, and measures positional information of the table by a head, of the plurality of heads, that faces the grating section; a drive device that drives the substrate stage supported by levitation on the base, to move the substrate; and a controller that controls a drive of the substrate stage based on displacement information of a head used in measurement of the positional information or correction information to compensate a measurement error of the measurement device that occurs due to a displacement of the head, and based on the positional information measured by the measurement device.
地址 Tokyo JP