发明名称 |
MOVABLE BODY SYSTEM, MOVABLE BODY DRIVE METHOD, PATTERN FORMATION APPARATUS, PATTERN FORMATION METHOD, EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD |
摘要 |
An exposure apparatus exposes a substrate with an exposure beam via a projection system supported by a frame. A substrate stage having a table that mounts the substrate is placed on a base under the projection system. A measurement device has a plurality of heads provided at the table and each irradiate a measurement beam on a grating section supported by the frame, and measures positional information of the table by a head of the plural heads, that faces the grating section. A drive device drives the substrate stage to move the substrate. A controller controls a drive of the substrate stage based on displacement information of a head used in measurement of the positional information or correction information to compensate a measurement error of the measurement device that occurs due to a displacement of the head, and based on the positional information measured by the measurement device. |
申请公布号 |
US2014327899(A1) |
申请公布日期 |
2014.11.06 |
申请号 |
US201414332000 |
申请日期 |
2014.07.15 |
申请人 |
NIKON CORPORATION |
发明人 |
KANAYA Yuho |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
1. An exposure apparatus that exposes a substrate with an exposure beam via a projection system, the apparatus comprising:
a frame supporting the projection system; a base placed under the projection system supported by the frame; a substrate stage having a table that mounts the substrate and placed on the base; a measurement device that has a plurality of heads that are provided at the table and each irradiate a measurement beam on a grating section supported by the frame, and measures positional information of the table by a head, of the plurality of heads, that faces the grating section; a drive device that drives the substrate stage supported by levitation on the base, to move the substrate; and a controller that controls a drive of the substrate stage based on displacement information of a head used in measurement of the positional information or correction information to compensate a measurement error of the measurement device that occurs due to a displacement of the head, and based on the positional information measured by the measurement device. |
地址 |
Tokyo JP |