| 摘要 |
PROBLEM TO BE SOLVED: To obtain concentration information by eliminating affection caused by abnormality of respective patterns in a print pattern formed by overlapping of two patterns.SOLUTION: A check pattern 100 comprises: an overlapping pattern part 121 on which a first pattern 101 and a second pattern 102 overlap; a first single pattern part 122 on which only the first pattern 101 is printed; and a second single pattern part 123 on which only the second pattern 102 is printed. By reading the check pattern 100 at a reading part, luminance of respective parts of the check pattern 100 is obtained. According to luminance of the overlapping part 121a, luminance of the single pattern parts 122, 123 are deducted for correcting the luminance of the overlapping part 121a. A position where has the highest luminance of the overlapping part 121a after correction is specified as a position where degree of overlapping of a first line pattern 111a forming the first pattern 101 and a second line pattern 112a forming the second pattern 102 is the largest. |
