发明名称 半導体装置
摘要 Disclosed is a semiconductor device capable of functioning as a memory device. The memory device comprises a plurality of memory cells, and each of the memory cells contains a first transistor and a second transistor. The first transistor is provided over a substrate containing a semiconductor material and has a channel formation region in the substrate. The second transistor has an oxide semiconductor layer. The gate electrode of the first transistor and one of the source and drain electrodes of the second transistor are electrically connected to each other. The extremely low off current of the second transistor allows the data stored in the memory cell to be retained for a significantly long time even in the absence of supply of electric power.
申请公布号 JP5619209(B2) 申请公布日期 2014.11.05
申请号 JP20130088040 申请日期 2013.04.19
申请人 发明人
分类号 H01L21/8242;H01L21/336;H01L21/8246;H01L27/105;H01L27/108;H01L27/112;H01L29/786;H01L29/788;H01L29/792 主分类号 H01L21/8242
代理机构 代理人
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