发明名称 III−V族化合物半導体結晶の製造方法、光半導体素子の製造方法
摘要 PROBLEM TO BE SOLVED: To provide a group III-V compound semiconductor crystal and an optical semiconductor element that prevent a reduction in the p-type carrier concentration due to pile-up of an n-type impurity, and to provide a method of manufacturing them. SOLUTION: A p-type group III-V compound semiconductor crystal is regrown on a p-InP layer 13a exposed in the atmosphere by sequentially stacking a p-InP layer 14a containing Zn and Sb and a p-InP layer 14b containing Zn. Additionally, the Zn concentration in the p-InP layer 14a is made higher than that in the p-InP layer 14b. COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP5620308(B2) 申请公布日期 2014.11.05
申请号 JP20110049875 申请日期 2011.03.08
申请人 发明人
分类号 H01S5/343 主分类号 H01S5/343
代理机构 代理人
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