发明名称 真空処理装置及び真空処理方法
摘要 Vacuum treatment installation or vacuum treatment method for carrying out a plasma method, wherein the treatment is carried out in a vacuum chamber, in which are disposed a device for generating an electric low voltage arc discharge (NVBE) comprised of a cathode and an anode electrically interconnectable with the cathode via an arc generator, and a workpiece carrier electrically interconnectable with a bias generator for receiving and moving workpieces, as well as at least one feed for inert and/or reactive gas. At least a portion of the surface of the anode is therein fabricated of graphite and is operated at high temperature.
申请公布号 JP5618824(B2) 申请公布日期 2014.11.05
申请号 JP20100508766 申请日期 2008.04.22
申请人 エーリコン・トレイディング・アーゲー・トリューバッハ 发明人 ユルゲン・ラム;ベノ・ヴィードリヒ;ステファン・カセマン;マルチェロ・ドルネッレ・ピメンタ;オルラウ・マスラー;バーバラ・ハンゼルマン
分类号 C23C16/50;C23C14/34;H05H1/48 主分类号 C23C16/50
代理机构 代理人
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