| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition allowing simple formation of a film, in a short time, to obtain a resin film maintaining high flatness and causing no film defect such as wrinkles, even if the film is subjected to other processings, such as, forming a conductive thin film on the resin film. <P>SOLUTION: The radiation-sensitive resin composition contains: a resin (A); a crosslinking agent (B) having an epoxy group; a crosslinking agent (C) having a triazine cyclic structure or a glycoluril structure and having at least one kind of functional group selected from among a group consisting of imino group, methylol group and alkoxybutyl group; and a radiation-sensitive compound (D). <P>COPYRIGHT: (C)2011,JPO&INPIT |
