RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

摘要

A resist composition contains a base material component having variable solubility for a developing solution by a reaction of acid and an acid generating agent component generating acid by exposure. The base material component contains a polymer compound having a composition unit represented by (a0-1) and the acid generating agent component contains a compound represented by (b1). Provided are a resist composition having excellent lithography properties and a method for forming a resist pattern using the resist composition.