| 摘要 |
PROBLEM TO BE SOLVED: To provide a vacuum deposition device capable of forming a uniform metal vapor deposition film with a high reflectance and no defect on a target of deposition. SOLUTION: In a vacuum deposition device, a deposition source and the target of deposition are arranged inside a vacuum chamber, and the substance vaporized from the deposition source is made to reach the surface of the target of deposition to be deposited. After the substance vaporized from an opening part of a crucible, to which the deposition source is inserted, is passed through a metallic conical cylinder, which is arranged just above the opening part of the crucible while placing its small diameter part downward and matching its axial center with that of the crucible and is heated to a temperature at which the vaporized substance keeps its vaporized condition, the substance is discharged to a space between the metallic conical cylinder and the target of deposition to reach the surface of the target of deposition to be deposited. When a distance between the opening of the crucible and the target of deposition is D, a length L of a slant of the metallic conical cylinder is 0.05-0.5D, and a conical angleθof the metallic conical cylinder is 45-75°. COPYRIGHT: (C)2012,JPO&INPIT |
