发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION AND PROCESS FOR PRODUCING SEMICONDUCTOR ELEMENT |
摘要 |
Disclosed is a photosensitive resin composition which exhibits positive or negative photosensitivity and is used as a mask in an ion implantation step, the photosensitive resin composition including, as a resin, (A) a polysiloxane. The photosensitive resin composition of the present invention has high heat resistance and is capable of controlling a pattern shape, and also has excellent ion implantation mask performance, thus enabling application to a low-cost high-temperature ion implantation process. |
申请公布号 |
EP2799928(A1) |
申请公布日期 |
2014.11.05 |
申请号 |
EP20120861162 |
申请日期 |
2012.12.21 |
申请人 |
TORAY INDUSTRIES, INC. |
发明人 |
FUJIWARA, TAKENORI;TANIGAKI, YUGO;SUWA, MITSUHITO |
分类号 |
G03F7/075;G03F7/004;G03F7/023;G03F7/038;G03F7/09 |
主分类号 |
G03F7/075 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|