| 摘要 |
<p>A multi-loop end-hall ion source for use in an ion beam process apparatus comprises an electromagnetic field part and a power supply unit. One side of the electromagnetic field part faces a substrate and is opened, and the other side of the electromagnetic field part is closed. A plurality of magnets are disposed on one side of the electromagnetic field part, such that N poles and S poles are arranged spaced apart from one another. A plurality of magnetic cores of the magnets are connected to the other side of the electromagnetic field part. Accordingly, multiple acceleration loops of plasma electrons are formed on one side of the electromagnetic field part. The power supply unit comprises a plurality of electrodes disposed at lower ends of the loops of the electromagnetic field part. The same voltage or different voltages are applied to the plurality of electrodes. In this manner, an ion source supplies plasma ions generated from inner gas inside the processing chamber by rotating the plasma electrons inside the processing chamber in multiple loops.</p> |
