| 发明名称 | Exposure apparatus and method for manufacturing device | ||
| 摘要 | A liquid immersion exposure apparatus and method expose a substrate through a liquid. The liquid is supplied to a space between a projection system of the exposure apparatus and an object, the object being different from the substrate, in a non-exposure operation. The object is moved relative to the projection system while supplying the liquid in the non-exposure operation, such that substantially no gas portion remains in the liquid filled in the space between the projection system and the object after the non-exposure operation. | ||
| 申请公布号 | US8879043(B2) | 申请公布日期 | 2014.11.04 |
| 申请号 | US201012926309 | 申请日期 | 2010.11.09 |
| 申请人 | Nikon Corporation | 发明人 | Nagasaka Hiroyuki |
| 分类号 | G03F7/20 | 主分类号 | G03F7/20 |
| 代理机构 | Oliff PLC | 代理人 | Oliff PLC |
| 主权项 | 1. A method used in a liquid immersion exposure apparatus in which a substrate is exposed through a liquid in a liquid immersion area, the method comprising: starting supplying of the liquid to a space below a projection system of the exposure apparatus in a state in which an object, which is different from the substrate, is below the projection system during a non-exposure operation, the liquid being supplied such that the liquid contacts the object; and moving the object relative to the projection system while supplying the liquid so as to form the liquid immersion area in the space during the non-exposure operation, such that substantially no gas portion remains in the liquid immersion area after the non-exposure operation. | ||
| 地址 | Tokyo JP | ||