发明名称 |
Method of manufacturing liquid injection head and exposure method |
摘要 |
Provided is a method of manufacturing a liquid injection head, the method including: forming, on a substrate, a negative photosensitive resin layer having a first surface on a side opposite to the substrate and a second surface on the substrate side; carrying out first exposure of the negative photosensitive resin layer; carrying out second exposure of the negative photosensitive resin layer; and forming the ejection orifice by carrying out development after the first exposure and the second exposure in which each of the first surface and the second surface has a portion in which a part of the unexposed portion in the first exposure and a part of the unexposed portion in the second exposure overlap and a portion in which a part of the unexposed portion in the first exposure and a part of the unexposed portion in the second exposure do not overlap. |
申请公布号 |
US8877433(B2) |
申请公布日期 |
2014.11.04 |
申请号 |
US201313857337 |
申请日期 |
2013.04.05 |
申请人 |
Canon Kabushiki Kaisha |
发明人 |
Ishikawa Tetsushi;Sato Tamaki |
分类号 |
B41J2/16 |
主分类号 |
B41J2/16 |
代理机构 |
Fitzpatrick, Cella, Harper & Scinto |
代理人 |
Fitzpatrick, Cella, Harper & Scinto |
主权项 |
1. A method of manufacturing a liquid injection head including an ejection orifice having an inclined shape, the method comprising:
forming on a substrate, a negative photosensitive resin layer having a first surface on a side opposite to the substrate and a second surface on the substrate side; carrying out first exposure of the negative photosensitive resin layer under a condition where an unexposed portion is formed so that a cross sectional area thereof taken along a plane in parallel with a substrate surface becomes larger from the second surface toward the first surface; carrying out second exposure of the negative photosensitive resin layer under a condition where an unexposed portion is formed so that a cross sectional area thereof taken along a plane in parallel with the substrate surface becomes smaller from the second surface toward the first surface; and forming the ejection orifice by carrying out development after the first exposure and the second exposure, wherein each of the first surface and the second surface has a portion in which a part of the unexposed portion in the first exposure and a part of the unexposed portion in the second exposure overlap and a portion in which a part of the unexposed portion in the first exposure and a part of the unexposed portion in the second exposure do not overlap. |
地址 |
Tokyo JP |