发明名称 Method of manufacturing liquid injection head and exposure method
摘要 Provided is a method of manufacturing a liquid injection head, the method including: forming, on a substrate, a negative photosensitive resin layer having a first surface on a side opposite to the substrate and a second surface on the substrate side; carrying out first exposure of the negative photosensitive resin layer; carrying out second exposure of the negative photosensitive resin layer; and forming the ejection orifice by carrying out development after the first exposure and the second exposure in which each of the first surface and the second surface has a portion in which a part of the unexposed portion in the first exposure and a part of the unexposed portion in the second exposure overlap and a portion in which a part of the unexposed portion in the first exposure and a part of the unexposed portion in the second exposure do not overlap.
申请公布号 US8877433(B2) 申请公布日期 2014.11.04
申请号 US201313857337 申请日期 2013.04.05
申请人 Canon Kabushiki Kaisha 发明人 Ishikawa Tetsushi;Sato Tamaki
分类号 B41J2/16 主分类号 B41J2/16
代理机构 Fitzpatrick, Cella, Harper & Scinto 代理人 Fitzpatrick, Cella, Harper & Scinto
主权项 1. A method of manufacturing a liquid injection head including an ejection orifice having an inclined shape, the method comprising: forming on a substrate, a negative photosensitive resin layer having a first surface on a side opposite to the substrate and a second surface on the substrate side; carrying out first exposure of the negative photosensitive resin layer under a condition where an unexposed portion is formed so that a cross sectional area thereof taken along a plane in parallel with a substrate surface becomes larger from the second surface toward the first surface; carrying out second exposure of the negative photosensitive resin layer under a condition where an unexposed portion is formed so that a cross sectional area thereof taken along a plane in parallel with the substrate surface becomes smaller from the second surface toward the first surface; and forming the ejection orifice by carrying out development after the first exposure and the second exposure, wherein each of the first surface and the second surface has a portion in which a part of the unexposed portion in the first exposure and a part of the unexposed portion in the second exposure overlap and a portion in which a part of the unexposed portion in the first exposure and a part of the unexposed portion in the second exposure do not overlap.
地址 Tokyo JP