发明名称 |
Packaged semiconductor devices, methods of packaging semiconductor devices, and PoP devices |
摘要 |
Packaged semiconductor devices, methods of packaging semiconductor devices, and package-on-package (PoP) devices are disclosed. In some embodiments, a method of packaging a semiconductor device includes forming through-package vias (TPVs) over a carrier, and coupling a semiconductor device to the carrier. The semiconductor device includes contact pads disposed on a surface thereof and an insulating material disposed over the contact pads. A molding material is formed over the carrier between the TPVs and the semiconductor device. Openings are formed in the insulating material using a laser drilling process over the contact pads, and a redistribution layer (RDL) is formed over the insulating material and the openings in the insulating material. A portion of the RDL is coupled to a top surface of each of the contact pads. |
申请公布号 |
US8877554(B2) |
申请公布日期 |
2014.11.04 |
申请号 |
US201313890162 |
申请日期 |
2013.05.08 |
申请人 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
发明人 |
Tsai Po-Hao;Hung Jui-Pin;Lin Jing-Cheng |
分类号 |
H01L23/48;H01L23/498;H01L21/768 |
主分类号 |
H01L23/48 |
代理机构 |
Slater & Matsil, L.L.P. |
代理人 |
Slater & Matsil, L.L.P. |
主权项 |
1. A method of packaging a semiconductor device, the method comprising:
forming a plurality of through-package vias (TPVs) over a carrier; coupling a semiconductor device to the carrier, the semiconductor device including a plurality of contact pads disposed on a surface thereof and an insulating material disposed over the plurality of contact pads; forming a molding material over the carrier between the plurality of TPVs and the semiconductor device; forming a plurality of openings in the insulating material using a laser drilling process, each of the plurality of openings being disposed over one of the plurality of contact pads; and forming a redistribution layer (RDL) over the insulating material and the plurality of openings in the insulating material, wherein a portion of the RDL is coupled to a top surface of each of the plurality of contact pads. |
地址 |
Hsin-Chu TW |