发明名称 Processing of nanostructured devices using microfabrication techniques
摘要 Systems and methods that incorporate nanostructures into microdevices are discussed herein. These systems and methods can allow for standard microfabrication techniques to be extended to the field of nanotechnology. Sensors incorporating nanostructures can be fabricated as described herein, and can be used to reliably detect a range of gases with high response.
申请公布号 US8877636(B1) 申请公布日期 2014.11.04
申请号 US201113036887 申请日期 2011.02.28
申请人 The United States of America as Represented by the Adminstrator of National Aeronautics and Space Administration 发明人 Hunter Gary W;Xu Jennifer C;Evans Laura J;Kulis Michael H;Berger Gordon M;Vander Wal Randall L
分类号 H01L23/495 主分类号 H01L23/495
代理机构 代理人 Earp, III Robert H.
主权项 1. A method of creating a microstructure incorporating nanotechnology, comprising: forming a pattern of bottom electrodes on a substrate of the microstructure, wherein one or more regions of the pattern of bottom electrodes has a relatively high electric field gradient; applying a suspension of nanostructures in a photoresist to the microstructure; creating at least one aligned nanostructure via performing dielectrophoresis on the suspension of nanostructures in the photoresist; exposing the photoresist; and creating a top electrode deposition that covers both the nanostructure and the pattern of bottom electrodes.
地址 Washington DC US