发明名称 Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition
摘要 A photosensitive composition comprising: (A) a compound capable of generating a compound having a specific structure upon irradiation with actinic rays or radiation, a pattern forming method using the photosensitive composition, and a compound capable of generating a compound having a specific structure upon irradiation with actinic rays or radiation.
申请公布号 US8877969(B2) 申请公布日期 2014.11.04
申请号 US201012759549 申请日期 2010.04.13
申请人 FUJIFILM Corporation 发明人 Wada Kenji
分类号 C07C311/48;C07C311/51;C07C233/91;C07C233/92;C07D323/00;C07D295/033;C07D233/64;C07D401/04;C07D211/58;C07D213/82;C07D211/46;C07D333/46;G03F7/038;C07D211/22;G03F7/039;C07D295/26;G03F7/004 主分类号 C07C311/48
代理机构 Sughrue Mion, PLLC 代理人 Sughrue Mion, PLLC
主权项 1. A photosensitive composition comprising: (A) a compound capable of generating a compound represented by formula (I) upon irradiation with actinic rays or radiation:wherein R1 and R2 each independently represents a monovalent organic group, provided that at least either one of R1 and R2 has a proton acceptor functional group, R1 and R2 may combine to form a ring and the ring formed may have a proton acceptor functional group; and X1 and X2 each independently represents —CO— or —SO2—, said compound (A) being a sulfonium salt compound of the compound represented by formula (I) or an iodonium salt compound of the compound represented by formula (I); (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation; and (C) a resin capable of decomposing under an action of an acid to increase the solubility of the resin (C) in an alkali developer, wherein: the proton acceptor functional group has a partial structure selected from the group consisting of a crown ether structure, an aza-crown ether structure, a tertiary amine structure, a secondary amine structure, a primary amine structure, a pyridine structure, an imidazole structure, a pyrazine structure and an aniline structure; when the proton acceptor functional group contains a tertiary amine, a secondary amine, or a primary amine, as a partial structure, a carbon atom connected to a nitrogen atom in the tertiary amine, the secondary amine, or the primary amine connects only to one or more hydrogen, carbon, and/or oxygen atoms; the resin (C) has no aromatic group; and the compound (A) capable of generating a compound represented by formula (I) upon irradiation with actinic rays or radiation is a compound represented by the following formula (A1) or (A2): wherein R201, R202 and R203 each independently represents an organic group, provided that when two members out of R201 to R203 are both an alkylene group, the two alkylene groups may combine to form a ring structure, and the ring may contain an oxygen atom, a sulfur atom, an ester bond, an amide bond or a carbonyl group; X represents an anion of the compound represented by formula (I); and R204 and R205 each independently represents an aryl group, an alkyl group or a cycloalkyl group.
地址 Tokyo JP