发明名称 DEPOSITION SYSTEM AND METHOD OF FORMING A METALLOID-CONTAINING MATERIAL THEREWITH
摘要 <p>A method of forming a metalloid-containing material comprises the step of preparing a hydrometalloid compound in a low volume on-demand reactor. The method further comprises the step of feeding the hydrometalloid compound prepared in the microreactor to a deposition apparatus. Additionally, the method comprises the step of forming the metalloid-containing material from the hydrometalloid compound via the deposition apparatus. A deposition system for forming the metalloid-containing material comprises at least one low volume on-demand reactor coupled to and in fluid communication with a deposition apparatus.</p>
申请公布号 KR20140127879(A) 申请公布日期 2014.11.04
申请号 KR20147025673 申请日期 2013.02.14
申请人 DOW CORNING CORPORATION 发明人 NGUYEN BINH;TELGENHOFF MICHAEL
分类号 C23C16/44;C23C16/24 主分类号 C23C16/44
代理机构 代理人
主权项
地址
您可能感兴趣的专利