| 摘要 |
<p>The present invention relates to a mask for a v-line face. The present invention is made of silicon for entirely covering the neck and jaw which are the lower part of a user′s face. The present invention comprises: a silicon main body which is horizontally formed as long as length 1-2 (W12); a jaw pulling part which is horizontally formed as long as length 1-3 (W13) in intaglio on the opposite side to the side which is vertically formed at the upper part of the silicon main body which contacts the user′s face; and a jaw fixing part which is formed to surround the jaw, which protrudes from the side opposite to the side which contacts the user′s face as high as height 1-1 (H11), and which is horizontally formed in an elliptical shape around the central part of the jaw pulling part as long as length 1-1.</p> |
