| 摘要 |
<p>The present invention relates to a clamping apparatus for a substrate. The clamping apparatus for a substrate, which is supported by a shuttle and in close contact with a mask on one side, for clamping a substrate comprises: a body fixed to the shuttle; a clamping assembly pivotally mounted on the body to clamp the substrate; and a pusher for rotating the clamping assembly to un-clamp the substrate by pressing one side of the clamping assembly. The clamping assembly unloads the substrate in a first rotation state by the pusher, and can unload the mask in a second rotation state rotating faster than the first rotation state. According to the present invention, by rotating a clamping plate in two stages in conjunction with the operation of the pusher, both of the substrate and the mask can be unloaded.</p> |
