发明名称 SEMICONDUCTOR DEVICE CHANNEL SYSTEM AND METHOD
摘要 A system and method for a channel region is disclosed. An embodiment comprises a channel region with multiple bi-layers comprising alternating complementary materials such as layers of InAs and layers of GaSb. The alternating layers of complementary materials provide desirable band gap characteristics for the channel region as a whole that individual layers of material may not.
申请公布号 KR101456773(B1) 申请公布日期 2014.10.31
申请号 KR20130002985 申请日期 2013.01.10
申请人 发明人
分类号 H01L21/336;H01L29/78 主分类号 H01L21/336
代理机构 代理人
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