发明名称 pInP-nCdS structure growth method
摘要 This invention relates to semiconductor technology and can be used for manufacturing solar radiation-to-electric energy converters.The pInP-nCdS structure growth method comprises placing a pre-etched pInP substrate with the crystallographic orientation (100) and disorientation of 3…5° in the direction (110) into a reactor, heating the substrate growth zone and stabilizing the temperature in the range of 400…450°C, spraying, in open oxygen flow, the CdCl2 and SnSl4 solutions with the formation on the substrate of a Cd2SnO4 layer, then spraying the CdCl2 and CS(NH2)2 solutions with the formation thereon of a nCdS layer.
申请公布号 MD4280(C1) 申请公布日期 2014.10.31
申请号 MD20130000062 申请日期 2013.09.04
申请人 UNIVERSITATEA DE STAT DIN MOLDOVA 发明人 BOTNARIUC VASILE;GORCEAC LEONID;COVAL ANDREI;CINIC BORIS;RAEVSCHI SIMION
分类号 H01L21/04;H01L21/20;H01L31/0236 主分类号 H01L21/04
代理机构 代理人
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