| 摘要 |
<p>Provided is a device for treating a substrate capable of stably carrying in and out in a large substrate or a plate substrate while having a chamber of the suppressed volume. The device for treating a substrate comprises an upper cover which can be opened and closed; a chamber which has a support frame having a support means for supporting the substrate installed therein and substrate containing space of a sealed state by placing the upper cover on the support frame; a conveyor for supporting, from downward, the substrate carried in from the outside of the chamber and the substrate carried out to the outside of the chamber to be transferred; and a conveyor moving device for moving the conveyor between the transfer location and the evacuation location out of the chamber, wherein the conveyor moving device moves the conveyor to the transfer location when the substrate is transferred and moves the conveyor to the evacuation location when a certain treatment is applied to the substrate which is supported by the supporting means to be placed in the chamber of the sealed state.</p> |
