| 摘要 |
<p>PROBLEM TO BE SOLVED: To ensure an exact form of a resist layer, in a resist coating and baking device for providing a resist layer on the surface of a roll.SOLUTION: A resist coating and baking device 1a comprises: a columnar roll 3 rotating about a central axis C1 extending in the horizontal direction, as the center of rotation; a roll rotation drive unit 29 for rotating the roll 3; a resist coating section 7 for coating the side face of the roll 3 with an uncured resist 6; a resist baking section 11a for curing the resist 6 applied in the resist coating section 7; and a control unit 21 for controlling to form, by applying the resist 6 in the resist coating section 7, a resist layer 5 on the roll 3 that is rotated by the roll rotation drive unit 29, to rotate the roll 3 for a predetermined time by the roll rotation drive unit 29 in order to adjust the resist layer 5, and to cure the resist layer 5 in the resist baking section 11a after adjustment.</p> |
