| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a film deposition unit which includes a gas introducing unit which has a simple structure, is easily maintained, is applied to a large area, and provides a wide range of a deposition condition to be set.SOLUTION: A film deposition unit 101 includes a body part 1 having a film deposition chamber 11, and a gas introducing unit 20. The gas introducing unit 20 includes: a top plate 21 which includes a first introduction part 21a and a second introduction part 21b which are for introducing a first gas and a second gas, and separates the body part 1 to an inside and an outside; a pipe 7a extending from the first introduction part 21a to the film deposition chamber 11; a shower plate 23b which is disposed through diffusion chambers 24a and 24b, has multiple second gas discharge port for supplying the second gas to the film deposition chamber 11, and a first gas discharge port for supplying the first gas to the film deposition chamber 11 by being opened to be connected to a pipe 7a; and cylindrical columnar members 25a-25c which have the pipe 7a inserted therein, and connect the top plate 21 and the shower plate 23b.</p> |
