发明名称 Semiconductor Device and Method of Forming Bump Structure with Insulating Buffer Layer to Reduce Stress on Semiconductor Wafer
摘要 A semiconductor wafer has a plurality of semiconductor die with contact pads for electrical interconnect. An insulating layer is formed over the semiconductor wafer. A bump structure is formed over the contact pads. The bump structure has a buffer layer formed over the insulating layer and contact pad. A portion of the buffer layer is removed to expose the contact pad and an outer portion of the insulating layer. A UBM layer is formed over the buffer layer and contact pad. The UBM layer follows a contour of the buffer layer and contact pad. A ring-shaped conductive pillar is formed over the UBM layer using a patterned photoresist layer filled with electrically conductive material. A conductive barrier layer is formed over the ring-shaped conductive pillar. A bump is formed over the conductive barrier layer. The buffer layer reduces thermal and mechanical stress on the bump and contact pad.
申请公布号 US2014319680(A1) 申请公布日期 2014.10.30
申请号 US201414328922 申请日期 2014.07.11
申请人 STATS ChipPAC, Ltd. 发明人 Choi JoonYoung;Kim YoungJoon;Cho SungWon
分类号 H01L23/00 主分类号 H01L23/00
代理机构 代理人
主权项 1. A method of making a semiconductor device, comprising: providing a semiconductor wafer including a contact pad; forming a buffer layer over the semiconductor wafer; forming a ring-shaped conductive pillar over the buffer layer; and forming a bump within the ring-shaped conductive pillar and electrically coupled to the contact pad.
地址 Singapore SG