发明名称 OPEN-ATMOSPHERE DEPOSITION OF A LIQUID ON SURFACES
摘要 A method for the deposition of a liquid on a substrate provides a liquid reservoir for holding the liquid, a nozzle being connected to the liquid reservoir and having a nozzle opening through which the droplets are ejected, a first electrode being in mechanical contact with the nozzle or the liquid reservoir; and a second electrode being arranged above or below the nozzle. The method comprises the application of a potential difference between the first electrode and the second electrode to generate an electric field at a surface of the liquid in the nozzle. The electric field causes the liquid to bend out of the nozzle so as to form a meniscus and to subsequently eject the liquid in the form of individual droplets or in the form of a continuous or intermittently released jet from the meniscus towards the substrate. The ejected liquid is deposited onto a sessile droplet on the substrate at a volumetric ejection flow rate. The sessile droplet is evaporating at a volumetric vaporization rate, and the volumetric ejection flow rate is chosen such that the sessile droplet is sustained by the ejected liquid.
申请公布号 WO2014173526(A2) 申请公布日期 2014.10.30
申请号 WO2014EP01062 申请日期 2014.04.22
申请人 ETH ZURICH 发明人 POULIKAKOS, DIMOS;SCHNEIDER, JULIAN;GALLIKER, PATRICK
分类号 B81C1/00 主分类号 B81C1/00
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