发明名称 |
OPEN-ATMOSPHERE DEPOSITION OF A LIQUID ON SURFACES |
摘要 |
A method for the deposition of a liquid on a substrate provides a liquid reservoir for holding the liquid, a nozzle being connected to the liquid reservoir and having a nozzle opening through which the droplets are ejected, a first electrode being in mechanical contact with the nozzle or the liquid reservoir; and a second electrode being arranged above or below the nozzle. The method comprises the application of a potential difference between the first electrode and the second electrode to generate an electric field at a surface of the liquid in the nozzle. The electric field causes the liquid to bend out of the nozzle so as to form a meniscus and to subsequently eject the liquid in the form of individual droplets or in the form of a continuous or intermittently released jet from the meniscus towards the substrate. The ejected liquid is deposited onto a sessile droplet on the substrate at a volumetric ejection flow rate. The sessile droplet is evaporating at a volumetric vaporization rate, and the volumetric ejection flow rate is chosen such that the sessile droplet is sustained by the ejected liquid. |
申请公布号 |
WO2014173526(A2) |
申请公布日期 |
2014.10.30 |
申请号 |
WO2014EP01062 |
申请日期 |
2014.04.22 |
申请人 |
ETH ZURICH |
发明人 |
POULIKAKOS, DIMOS;SCHNEIDER, JULIAN;GALLIKER, PATRICK |
分类号 |
B81C1/00 |
主分类号 |
B81C1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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