SUBSTRATES HAVING A BROADBAND ANTIREFLECTION LAYER AND METHODS OF FORMING A BROADBAND ANTIREFLECTION LAYER

摘要

In accordance with the purpose(s) of the present disclosure, as embodied and broadly described herein, embodiments of the present disclosure, in one aspect, relate to methods of making substrates having an antireflective layer, substrates having an antireflective layer, devices including a substrate having an antireflective layer, and the like.

主权项

1. A method of forming an antireflective layer on a substrate, comprising:
disposing a multi-cyrstalline silicon substrate in a solution; disposing the particles in the solution so that the particles cover the surface of the solution, wherein the particles are silica particles having a diameter of about 500 nm or less; removing the substrate from the solution so that the particles form a colloidal monolayer of particles on the surface of the substrate; etching the substrate having the colloidal monolayer of particles disposed thereon to form the an antireflective layer on the substrate, wherein the antireflective layer has a height of about 500 nm to 1000 nm, wherein the antireflective layer has a plurality of pillars that have a spacing of about 10 nm to 300 nm between a pair of pillars as measured from pillar base to pillar base, and the pillar has a diameter at the base of about 50 to 300 nm; and removing the colloidal monolayer of particles.