DEFINED DOSING ATMOSPHERIC TEMPERATURE AND PRESSURE VAPOR DEPOSITION SYSTEM

摘要

A closed chemical introduction system used to deliver active ingredients in liquid chemical to a chemical vapor deposition system includes a robust, moisture-free cartridge containing a defined dose of liquid chemical. The cartridge is placed on a mounting slot specially configured to receive the cartridge. Upon initiating the system, a first linear mechanical actuator securely holds the cartridge in the slot, while an extraction lance attached to a second linear mechanical actuator punctures the cartridge from the bottom, extracts the liquid chemical and delivers it to a vaporization chamber. The vaporization chamber evaporates the liquid chemical and delivers the vapors containing the active ingredients to the chemical vapor deposition system. The chemical vapor deposition system may include a treatment chamber, a conveyor, a compressed clean air system to provide separate treatment compartments within the chamber, a moisture system, a chemical vapor system, and a neutralization system to neutralize harmful byproducts.

主权项

1. A method of automatically introducing air sensitive liquid chemical to a substrate in a closed chemical vapor deposition system comprising:
providing a moisture-free cartridge containing a defined dosage of specific liquid chemical for a chemical vapor deposition process; providing a closed extraction mechanism to extract the liquid chemical from the cartridge; and vaporizing and delivering active ingredients in the extracted liquid chemical to a treatment chamber of the chemical vapor deposition system.