发明名称 |
ANTI-DIFFUSION LAYER, PREPARATION METHOD THEREOF, THIN-FILM TRANSISTOR (TFT), ARRAY SUBSTRATE, DISPLAY DEVICE |
摘要 |
An anti-diffusion layer, a preparation method thereof, a thin-film transistor (TFT), an array substrate and a display device are provided, involve the display device manufacturing field and can resolve problem that a high atmosphere temperature is need in process of preparing a tantalum dioxide anti-diffusion layer by PVD or CVD, which causes the gate electrode to volatilize and affect the performance of a display device. The method for preparing the anti-diffusion layer comprises: placing a conductive base (1) and a cathode (4) in a tantalum sulfate solution (3), taking the conductive base (1) as an anode, and forming a tantalum dioxide anti-diffusion layer on the conductive base (1) after energizing. |
申请公布号 |
US2014319529(A1) |
申请公布日期 |
2014.10.30 |
申请号 |
US201314345607 |
申请日期 |
2013.05.31 |
申请人 |
Jiang Chunsheng;Chen Haijing;Wang Dongfang |
发明人 |
Jiang Chunsheng;Chen Haijing;Wang Dongfang |
分类号 |
H01L21/288;H01L21/02;H01L27/12;H01L29/51;H01L29/49 |
主分类号 |
H01L21/288 |
代理机构 |
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代理人 |
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主权项 |
1. A method for preparing an anti-diffusion layer, comprising:
placing a conductive base and a cathode in a electrolytic solution, taking the conductive base as an anode, and forming a tantalum dioxide anti-diffusion layer on the conductive base after energizing. |
地址 |
Beijing CN |