发明名称 |
METHODS AND APPARATUS FOR SYNCHRONISING RF PULSES IN A PLASMA PROCESSING SYSTEM |
摘要 |
<p>A synchronized pulsing arrangement for providing at least two synchronized pulsing RF signals to a plasma processing chamber of a plasma processing system is provided. The arrangement includes a first RF generator for providing a first RF signal. The first RF signal is provided to the plasma processing chamber to energize a plasma therein, the first RF signal representing a pulsing RF signal. The arrangement also includes a second RF generator for providing a second RF signal to the plasma processing chamber. The second RF generator has a sensor subsystem for detecting values of at least one parameter associated with the plasma processing chamber that reflects whether the first RF signal is pulsed high or pulsed low and a pulse controlling subsystem for pulsing the second RF signal responsive to the detecting the values of at least one parameter.</p> |
申请公布号 |
SG11201404493Y(A) |
申请公布日期 |
2014.10.30 |
申请号 |
SG11201404493Y |
申请日期 |
2013.02.07 |
申请人 |
LAM RESEARCH CORPORATION |
发明人 |
VALCORE, JOHN;SINGH, HARMEET;LYNDAKER, BRADFORD J. |
分类号 |
H05H1/24;H05H1/46 |
主分类号 |
H05H1/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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