| 主权项 |
1. A resist underlayer composition, comprising:
a solvent; and a compound including a moiety represented by the following Chemical Formula 1: wherein, in Chemical Formula 1, A1 and A2 are each independently one selected from the following Group 1, B1 is one selected from the following Group 2, and R1 and R2 are each independently one selected from hydrogen, a hydroxy group, a substituted or unsubstituted C1 to C10 alkyl group, a substituted or unsubstituted C6 to C10 aryl group, an allyl group, a halogen, or a C1 to C10 alkoxy group substituted with a metal element, P, S, or Se, wherein, in Group 1, M1 and M2 are each independently a metal element, a metal complex, C, N, P, S, Se, H, or a combination thereof, provided that in at least one of A1 and A2, M1 or M2 of the Group 1 includes a metal element, a metal complex, P, S, Se, or a combination thereof, |
