PHASE SHIFT MASK BLANK AND MANUFACTURING METHOD THEREOF, MANUFACTURING METHOD OF PHASE SHIFT MASK, AS WELL AS MANUFACTURING METHOD OF DISPLAY DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a phase shift mask blank for manufacturing a display device that can be formed into a cross-sectional shape exhibiting phase effect effectively by wet etching.SOLUTION: A phase shift mask blank comprises: a transparent substrate 21; a light-semitransmissive film 22 that is formed on a main surface of the transparent substrate 21, has a property of changing a phase of a light with a representative wavelength contained in an exposure light by about 180 degrees, and is made of a chromium based material; and an etching mask film 23 that is formed on the light-semitransmissive film 22 and is made of a metal silicide based material.