| 发明名称 |
VAPOR DEPOSITION APPARATUS, DEPOSITION METHOD USING THE SAME, AND METHOD OF MANUFACTURING ORGANIC LIGHT-EMITTING DISPLAY APPARATUS |
| 摘要 |
A vapor deposition apparatus for forming a deposition layer on a substrate includes a supply unit that is supplied with a first raw gas to form the deposition layer and an auxiliary gas, wherein the auxiliary gas does not constitute a raw material to form the deposition layer, a reaction space that is connected to the supply unit to be supplied with the first raw gas and the auxiliary gas, a plasma generator in the reaction space to convert at least a portion of the first raw gas into a radical form, and a first injection portion that is connected to the reaction space and that supplies at least a radical material of the first raw gas toward the substrate. |
| 申请公布号 |
US2014322849(A1) |
申请公布日期 |
2014.10.30 |
| 申请号 |
US201414250697 |
申请日期 |
2014.04.11 |
| 申请人 |
Samsung Display Co., Ltd. |
发明人 |
KIM Jae-Hyun;HUH Myung-Soo |
| 分类号 |
H01L51/00;H01L51/56 |
主分类号 |
H01L51/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A vapor deposition apparatus for forming a deposition layer on a substrate, the vapor deposition apparatus comprising:
a supply unit that is supplied with a first raw gas to form the deposition layer and with an auxiliary gas; a reaction space that is connected to the supply unit to be supplied with the first raw gas and the auxiliary gas; a plasma generator in the reaction space to convert at least a portion of the first raw gas into a radical form; and a first injection portion that is connected to the reaction space and that supplies at least a radical material of the first raw gas toward the substrate. |
| 地址 |
Gyeonggi-do KR |
