发明名称 INSPECTION METHOD AND INSPECTION APPARATUS
摘要 An inspection method including following steps is provided. A pixel array substrate including a plurality of pixel units is in contact with a photoelectric inspection device. A plurality of electrical signals is inputted to the pixel units of the pixel array substrate and the photoelectric inspection device. Based on an optical property of the photoelectric inspection device, the pixel units of the pixel array substrate are being examined on whether they are normal or not. Moreover, an inspection apparatus realizing the inspection method is also provided.
申请公布号 US2014320137(A1) 申请公布日期 2014.10.30
申请号 US201414178283 申请日期 2014.02.12
申请人 E Ink Holdings Inc. 发明人 Liu Chuan-Feng;Huang Jen-Shiun;Huang Pei-Lin;Li Shi-Lin;Tsai Chen-Fa;Chang Yung-Sheng
分类号 G09G3/00 主分类号 G09G3/00
代理机构 代理人
主权项 1. An inspection method comprising: providing a pixel array substrate, the pixel array substrate comprising a plurality of pixel units; providing a photoelectric inspection device; enabling the photoelectric inspection device to be in contact with the pixel array substrate; inputting a plurality of electrical signals to the pixel units of the pixel array substrate and the photoelectric inspection device; and determining whether the pixel units of the pixel array substrate are normal or not based on an optical property of the photoelectric inspection device.
地址 Hsinchu TW