| 摘要 |
<p>A manufacturing method of a surface plasmonic color filter includes: a step (a) of forming a photonic crystal structure on a substrate; a step (b) of forming a first dielectric layer on the photonic crystal structure; a step (c) of forming a metal film on the first dielectric layer; a step (d) of forming a photosensitive layer on the metal film; a step (e) of forming a nano-hole array having periodicity on the photosensitive layer by irradiating laser interference patterns on the photosensitive layer; a step (f) of forming a nano-hole array on the metal film by etching the metal film using the nano-hole array of the photosensitive layer; and a step (g) of removing the photosensitive layer having the nano-hole array from the metal film on which the nano-hole array is formed and forming a second dielectric layer including the same dielectric substance as the dielectric substance included in the first dielectric layer on the metal film on which the nano-hole array is formed. The cutoff wavelength band of the photonic crystal structure is different from the pass wavelength band of the nano-hole array.</p> |
