发明名称 |
VERTICALLY STRUCTURED GROUP III NITRIDE SEMICONDUCTOR LED CHIP AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
A method for manufacturing a vertically structured Group III nitride semiconductor LED chip includes a first step of forming a light emitting structure laminate; a second step of forming a plurality of separate light emitting structures by partially removing the light emitting structure laminate to partially expose the growth substrate; a third step of forming a conductive support, which conductive support integrally supporting the light emitting structures; a fourth step of separating the growth substrate by removing the lift-off layer; and a fifth step of dividing the conductive support between the light emitting structures thereby singulating a plurality of LED chips each having the light emitting structure. A first through-hole is formed to open in a central region of each of the light emitting structures such that at least the lift-off layer is exposed, and an etchant is supplied from the first through-hole in the fourth step. |
申请公布号 |
US2014319557(A1) |
申请公布日期 |
2014.10.30 |
申请号 |
US201114117281 |
申请日期 |
2011.05.12 |
申请人 |
Cho Meoung Whan;Lee Seog Woo;Jang Pil Guk;Toba Ryuichi;Kadowaki Yoshitaka |
发明人 |
Cho Meoung Whan;Lee Seog Woo;Jang Pil Guk;Toba Ryuichi;Kadowaki Yoshitaka |
分类号 |
H01L33/00;H01L33/32 |
主分类号 |
H01L33/00 |
代理机构 |
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代理人 |
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主权项 |
1. A method for manufacturing a vertically structured Group III nitride semiconductor LED chip, comprising:
a first step of forming a light emitting structure laminate by sequentially stacking a first conductivity type Group III nitride semiconductor layer, a light emitting layer, and a second conductivity type Group III nitride semiconductor layer on a growth substrate with a lift-off layer provided therebetween, the second conductivity type being different from the first conductivity; a second step of forming a plurality of separate light emitting structures by partially removing the light emitting structure laminate to partially expose the growth substrate; a third step of forming a conductive support having a lower electrode, which conductive support integrally supporting the plurality of the light emitting structures; a fourth step of separating the growth substrate from the plurality of the light emitting structures by removing the lift-off layer using a chemical lift-off process; and a fifth step of dividing the conductive support between the light emitting structures thereby singulating a plurality of LED chips each having the light emitting structure supported by the conductive support, wherein a first through-hole is formed to open in a central region of each of the light emitting structures such that at least the lift-off layer is exposed, before the fourth step, and an etchant is supplied from the first through-hole in the fourth step. |
地址 |
Yongin KR |