| 摘要 |
A method for preparing an array substrate, an array substrate, and a display apparatus. The array substrate comprises: a substrate (1), and a flat panel electrode (21), a gate (32), a gate line (31), a gate insulating thin film (5), a semiconductor silicon island region (61), a source (81), a drain (82), a data line (83), and a slit electrode (101) formed on the substrate (1). A gate line lead hole (13) and a data line lead hole (14) are further disposed on the substrate (1). The gate (32) and the gate line (31) comprise a first transparent conductive material (13) and a grid metal material stacked sequentially. The slit electrode (101) is directly connected to the drain(82). Through the gate line lead hole (13), a second transparent conductive material is connected to the gate line (31). Through the data line lead hole (14), the second transparent conductive material is connected to the data line (83). |
