发明名称 SEMICONDUCTOR DEVICE
摘要 A semiconductor device includes a substrate, a gate positioned on the substrate, a drain and a source formed in the substrate at respective two sides of the gate, and a doped region formed in the source. The drain and the source comprise a first conductivity type and the doped region comprises a second conductivity type. The first conductivity type and the second conductivity type are complementary to each other.
申请公布号 US2014319613(A1) 申请公布日期 2014.10.30
申请号 US201313873261 申请日期 2013.04.30
申请人 UNITED MICROELECTRONICS CORP. 发明人 He Yi-Ning;Chen Lu-An;Tang Tien-Hao
分类号 H01L23/552 主分类号 H01L23/552
代理机构 代理人
主权项 1. An electrostatic discharge (ESD) protection semiconductor device comprising: a substrate; a gate positioned on the substrate; a drain and a source formed in the substrate at respective two sides of the gate, the drain and the source comprising a first conductivity type; and a first doped region formed at one end of the source, the doped region comprising a second conductivity type complementary to the first conductivity type.
地址 Hsin-Chu City TW