发明名称 |
SEMICONDUCTOR DEVICE |
摘要 |
A semiconductor device includes a substrate, a gate positioned on the substrate, a drain and a source formed in the substrate at respective two sides of the gate, and a doped region formed in the source. The drain and the source comprise a first conductivity type and the doped region comprises a second conductivity type. The first conductivity type and the second conductivity type are complementary to each other. |
申请公布号 |
US2014319613(A1) |
申请公布日期 |
2014.10.30 |
申请号 |
US201313873261 |
申请日期 |
2013.04.30 |
申请人 |
UNITED MICROELECTRONICS CORP. |
发明人 |
He Yi-Ning;Chen Lu-An;Tang Tien-Hao |
分类号 |
H01L23/552 |
主分类号 |
H01L23/552 |
代理机构 |
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代理人 |
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主权项 |
1. An electrostatic discharge (ESD) protection semiconductor device comprising:
a substrate; a gate positioned on the substrate; a drain and a source formed in the substrate at respective two sides of the gate, the drain and the source comprising a first conductivity type; and a first doped region formed at one end of the source, the doped region comprising a second conductivity type complementary to the first conductivity type. |
地址 |
Hsin-Chu City TW |