| 发明名称 |
ORGANIC ELECTROLUMINESCENT DISPLAY DEVICE |
| 摘要 |
In order to provide an organic electroluminescent display device which does not exhibit redness in reflected external light, and exhibits little fluctuation in the hue of a black image as a result of changes in environmental temperature and differences in the light emitting state, the organic electroluminescent display device according to the present invention comprises, in order from the viewing side, a protective film, a polarizer, a λ/4 phase difference film, and an organic electroluminescent element, and is characterized in that the λ/4 phase difference film satisfies formulas (1) and (2) below.;Ro(450)<Ro(550)<Ro(650) Formula (1);0.90<photoelastic coefficient ratio(450/650)value<1.20 Formula (2) |
| 申请公布号 |
US2014319508(A1) |
申请公布日期 |
2014.10.30 |
| 申请号 |
US201214355682 |
申请日期 |
2012.11.07 |
| 申请人 |
Konica Minolta, Inc. |
发明人 |
Tanihara Norie;Ren Rieko;Tasaka Koji;Nakazawa Yukihito;Mishima Kenji;Kogure Midori |
| 分类号 |
H01L51/50 |
主分类号 |
H01L51/50 |
| 代理机构 |
|
代理人 |
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| 主权项 |
1. An organic electroluminescent display device comprising:
a protective film; a polarizer; a λ/4 phase difference film; and an organic electroluminescent element in this order from a viewing side of the organic electroluminescent display device, wherein the λ/4 phase difference film satisfies following expressions (1) and (2):
Ro(450)<Ro(550)<Ro(650) Expression (1)0.90<ratio of photoelastic coefficients(450/650)<1.20 Expression (2) wherein in the expression (1), Ro(450), Ro(550) and Ro(650) are in-plane retardations obtained from measurement at 23° C. and 55% RH of the λ/4 phase difference film at a light wavelength of 450 nm, 550 nm and 650 nm, respectively; and in the expression (2), the ratio of photoelastic coefficients (450/650) is obtained by dividing a photoelastic coefficient (450) obtained from measurement at 23° C. and 55% RH of the λ/4 phase difference film at a light wavelength of 450 nm by a photoelastic coefficient (650) obtained from measurement under the same condition of the λ/4 phase difference film at a light wavelength of 650 nm. |
| 地址 |
Tokyo JP |
