| 发明名称 |
INFRARED RAY CUT-OFF MATERIAL, DISPERSION OF INFRARED RAY CUT-OFF MATERIAL, INFRARED RAY CUT-OFF FILM-FORMING COMPOSITION, AND INFRARED RAY CUT-OFF FILM |
| 摘要 |
An infrared ray cut-off material is formed of phosphorus-doped antimony tin oxide powder, in which a content of antimony in terms of SbO2 is not less than 14 parts by mass and not more than 30 parts by mass with respect to 100 parts by mass of the infrared ray cut-off material, a content of phosphorus in terms of PO2.5 is not less than 1 part by mass and not more than 25 parts by mass with respect to 100 parts by mass of the infrared ray cut-off material, and a balance other than antinomy oxide and phosphorus oxide is tin oxide. |
| 申请公布号 |
US2014320954(A1) |
申请公布日期 |
2014.10.30 |
| 申请号 |
US201313978982 |
申请日期 |
2013.01.11 |
| 申请人 |
MITSUBISHI MATERIALS CORPORATION |
发明人 |
Yoshizumi Motohiko;Nakabayashi Akira |
| 分类号 |
G02B5/20;C03C3/16;C03C4/08 |
主分类号 |
G02B5/20 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An infrared ray cut-off material that is formed of phosphorus-doped antimony tin oxide powder,
wherein a content of antimony in terms of SbO2 is not less than 14 parts by mass and not more than 30 parts by mass with respect to 100 parts by mass of the infrared ray cut-off material, a content of phosphorus in terms of PO2.5 is not less than 1 part by mass and not more than 25 parts by mass with respect to 100 parts by mass of the infrared ray cut-off material, and a balance other than antinomy oxide and phosphorus oxide is tin oxide. |
| 地址 |
Tokyo JP |
