Electron beam vapor deposition apparatus for depositing multi-layer coating

摘要

A physical vapor deposition apparatus (10) includes first and second chambers (12a,12b). A first directed vapor deposition crucible (30a) is at least partially within the first chamber (12a) for presenting a first source material (32a) to be deposited on a work piece. A second directed vapor deposition crucible (30b) is at least partially within the second chamber (12b) for presenting a second, different source material (32b) to be deposited on the work piece. At least one of the materials may be deposited as a coating.