发明名称 Magnetic field applying sample holder; and charged particle beam apparatus using same
摘要 The disclosed invention provides a sample holder capable of reducing or preventing the influence of a charged particle beam 11 deflected by applying a magnetic field to a sample 201 and provided with means for simply switching between a mode of observing the sample while applying a magnetic field to the sample, and a mode free of a magnetic field in which a magnetic field becomes zero completely. The sample holder includes a magnetic field generating element 301 including three or more magnetic gaps 351-353 for applying a magnetic field to a sample, a cantilever-beam-shaped sample holding element 202 that holds the sample 201 on one end thereof, and a moving mechanism that adjusts a relative position between a sample and a magnetic gap. The magnetic gaps 351-353 can be placed along an optical axis of the charged particle beam 11.
申请公布号 EP2797099(A2) 申请公布日期 2014.10.29
申请号 EP20140165693 申请日期 2014.04.23
申请人 HITACHI LTD. 发明人 SUGAWARA, AKIRA;SHIMAKURA, TOMOKAZU;TAKAHASHI, YOSHIO
分类号 H01J37/09;H01J37/20 主分类号 H01J37/09
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