发明名称 |
Magnetic field applying sample holder; and charged particle beam apparatus using same |
摘要 |
The disclosed invention provides a sample holder capable of reducing or preventing the influence of a charged particle beam 11 deflected by applying a magnetic field to a sample 201 and provided with means for simply switching between a mode of observing the sample while applying a magnetic field to the sample, and a mode free of a magnetic field in which a magnetic field becomes zero completely. The sample holder includes a magnetic field generating element 301 including three or more magnetic gaps 351-353 for applying a magnetic field to a sample, a cantilever-beam-shaped sample holding element 202 that holds the sample 201 on one end thereof, and a moving mechanism that adjusts a relative position between a sample and a magnetic gap. The magnetic gaps 351-353 can be placed along an optical axis of the charged particle beam 11. |
申请公布号 |
EP2797099(A2) |
申请公布日期 |
2014.10.29 |
申请号 |
EP20140165693 |
申请日期 |
2014.04.23 |
申请人 |
HITACHI LTD. |
发明人 |
SUGAWARA, AKIRA;SHIMAKURA, TOMOKAZU;TAKAHASHI, YOSHIO |
分类号 |
H01J37/09;H01J37/20 |
主分类号 |
H01J37/09 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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