| 摘要 |
<p>A method of forming an organic thin film transistor the method comprising: seeding a surface outside a channel region with one or more crystallization sites prior to deposition of the organic semiconductor; depositing a solution of the organic semiconductor onto the seeded surface and over the channel region whereby the organic semiconductor begins forming a crystal domain at the or each of the crystallization sites, the or each crystal domain growing from its crystallization site across the channel region in a direction determined by an advancing surface evaporation front; and applying energy to control the direction and rate of movement of the surface evaporation front thereby controlling the direction and rate of growth of the or each crystal domain across the channel region from the one or more crystallization sites outside the channel region.</p> |
