Plasma source with vertical gradient

摘要

A plasma source includes upper and lower portions. In a first aspect, an electrical power source supplies greater power to the upper portion than to the lower portion. In a second aspect, the plasma source includes three or more power couplers that are spaced apart vertically, wherein the number of plasma power couplers in the upper portion is greater than the number of plasma power couplers in the lower portion. The upper and lower portions of the plasma source can be defined as respectively above and below a horizontal geometric plane that bisects the vertical height of the plasma source. Alternatively, the upper and lower portions can be defined as respectively above and below a horizontal geometric plane that bisects the combined area of first and second workpiece positions.

主权项

1. Apparatus for coupling electrical power to a plasma, comprising:
a plasma source comprising at least three plasma power couplers that are spaced apart vertically; wherein the plasma source is characterized by an upper portion and a lower portion that are the respective portions of the plasma source that are respectively above and below a horizontal geometric plane that bisects the vertical height of the plasma source; and wherein the number of said plasma power couplers that are in the upper portion of the plasma source is greater than the number of said plasma power couplers that are in the lower portion of the plasma source.