Method of making superoleophobic re-entrant resist structures

摘要

A device and method for preparing a device having a superoleophobic surface are disclosed. The method includes providing a substrate; coating a lift-off resist layer on the substrate; baking the lift-off resist layer; layering a photoresist layer on the lift-off resist layer; performing photolithography to create a textured pattern in the photoresist layer and the lift-off resist layer, and chemically modifying the textured pattern to create a superoleophobic surface.

主权项

1. A method comprising:
providing a substrate; coating a lift-off resist layer on the substrate baking the lift-off resist layer; depositing a photoresist on the baked lift-off resist layer to create a layered structure; baking the photoresist layer; exposing the photoresist layer to UV radiation; optionally baking the exposed photoresist layer; developing the photoresist layer; developing the lift-off resist layer to create a textured pattern; optionally etching the textured pattern; and modifying a surface of the textured pattern to create a superoleophobic surface.